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Technical Data: High Output of Xenon Excimer Vacuum Ultraviolet Light Lamp

Realization of light intensity of 1-2 kW/m²! Examination of the essential technological elements for high output.

Around the end of the 1980s, high-brightness vacuum ultraviolet lamps utilizing excimer emission were developed. For example, excimer lamps using xenon gas can produce vacuum ultraviolet light at a wavelength of 172 nm with a high light intensity of 100 W/m², and they are actively applied in processes such as photodecomposition cleaning and photomodification of material surfaces. In this presentation, we examined the necessary technological elements for achieving a light intensity of 1-2 kW/m², which is 10 to 20 times brighter than conventional lamps. [Contents] - Principles of excimer lamps and research and development objectives - Discharge methods - Lamp shapes *For more details, please refer to the PDF document or feel free to contact us.

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Technical Data: Current Status of Vacuum Ultraviolet Excimer Lamps and Their Industrial Applications

It is possible to break molecular bonds through non-thermal processes! Introduction to applications in the semiconductor-related field.

This document introduces the current status of "vacuum ultraviolet excimer lamps" and their industrial applications. Excimer refers to a dimer formed by one atom or molecule in an excited state and one atom or molecule in the ground state. The "vacuum ultraviolet excimer lamp" has features such as the ability to emit quasi-monochromatic light and short-wavelength light not found in general lamps, as well as the capability for instant lighting and flashing. Additionally, because vacuum ultraviolet light has a short wavelength and high photon energy, it can break molecular bonds through non-thermal processes. [Contents] ■ What is a vacuum ultraviolet excimer lamp? ■ Applications of vacuum ultraviolet excimer lamps *For more details, please refer to the PDF document or feel free to contact us.

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Technical Data: Photochemical Surface Treatment of Materials Using Vacuum Ultraviolet Excimer Lamps

Applications in various industrial fields are possible, such as light cleaning, light thin film formation, light modification, and photochemical modification!

The photochemical surface treatment method for materials using vacuum ultraviolet excimer lamps has characteristics such as "low cost" and "ease of large area processing." As a result, it can be applied to various industrial fields, including photonic cleaning, photonic thin film formation, photonic modification, and photochemical modification. This document presents the results of an investigation into the effects of photochemical surface treatment using atomic force microscopy (AFM). [Contents] ■ Introduction ■ Experiment ■ Results *For more details, please refer to the PDF document or feel free to contact us.

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